| 摘要 |
A glass substrate etching device is provided to transfer a glass substrate without an additional transfer jig. A process bath(10) etches a substrate(S). A spray-pipe(20) sprays etching solution. A lower transfer loop(30) transfers the substrate while fixing and supporting a bottom surface of the substrate while the lower transfer loop is circulated in inside/outside of the process bath. An upper transfer loop(40) transfers the substrate while supporting an upper surface of the substrate not to move the substrate left/right while the upper transfer loop is circulated in inside/outside of the process bath. An upper-side support loop fixes an upper part of a connecting unit supporting a side of the substrate while the upper-side support loop is circulated in inside/outside of the process bath. A lower-side support loop fixes a lower part of a connecting unit supporting a side of the substrate while the lower-side support loop is circulated in inside/outside of the process bath. The connecting unit is connected to the upper-side support loop and lower-side support loop. The side-support pin of the substrate is adhered to the connecting unit. The side-support pin supports a side of the substrate. |
