| 摘要 |
A semiconductor device and a layout method thereof are provided to improve uniformity of an isolation active region of transistors by forming a dummy transistor on non-pattern region inside a leaf cell or a space region between leaf cells. A semiconductor device includes a plurality of leaf cell regions(40, 44) and a plurality of block regions(32). A transistor pattern is formed on a plurality of leaf cell regions. Each leaf cell region is formed on a plurality of block regions. A dummy transistor pattern is formed on at least one or more region among the leaf cell region or a space region. A region having the dummy transistor pattern is non-pattern region(46). The dummy transistor pattern is parallel arranged with an active region of the transistor pattern, and includes a dummy active region of the same length. |
