| 摘要 |
An apparatus for treating substrate and a method thereof are provided to reduce whole cleaning operation time of a bowl by periodically cleaning the bowl without separate operation of the bowl. An apparatus(10) for treating substrate comprises a cleaning jig, a spin head(210), a bowl(100), and a back nozzle member(300). The spin head supports and rotates the cleaning jig. The bowl surrounds the spin head, and is cleaned by a cleaning liquid sprayed from a rear side of the cleaning jig. The back nozzle member is positioned in a bottom of the cleaning jig, and sprays the cleaning liquid on the rear side of the cleaning jig. An edge part of the cleaning jig is tilted toward a lower direction from the rear side of the cleaning jig.
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