SUBSTRATE HEAT-TREATING APPARATUS, AND SUBSTRATE HEAT-TREATING METHOD

摘要

Provided is a substrate heat-treating apparatus, in which a substrate holder unit having a substrate stage made of highly emissive carbon or carbon-coated material is so disposed in a vacuum chamber as can move up and down, and in which a heating unit having a radiation face to confront the substrate stage is disposed above the substrate holder unit in the vacuum chamber. The substrate stage is disposed close to the radiation face so that the substrate can be heated with the radiation heat from the radiation face while being out of contact with the substrate placed on the substrate stage. The substrate holder unit is equipped with a radiation plate and a reflection plate.