| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for projecting a patterned beam onto a substrate. <P>SOLUTION: An illumination system supplies a projection beam of radiation. A pattern is imparted to the projection beam, for example by an array of individually controllable elements. The substrate is supported on a substrate table and the patterned beam is projected onto a target portion of the substrate by a projection system. The projection system defines a pupil between the patterning system and the substrate table and a series of lens components are located between the pupil and the substrate table. The lens components comprise a beam expander, for expanding the beam from the pupil, and an array of lenses extending transversely relative to the beam such that each lens of the array focuses a respective portion of the projection beam onto a respective part of the target portion of the substrate. The position of at least one of the lens components, for example a field lens of the beam expander or the lens array, is adjusted to adjust the magnification of the projection system. <P>COPYRIGHT: (C)2009,JPO&INPIT |
