发明名称 METHOD FOR MEASURING LEVEL OF LIQUID SURFACE IN APPARATUS FOR PULLING SINGLE CRYSTAL BY CZ METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for easily and accurately measuring the level of a liquid surface by selecting the most suitable reflection method from a plurality of reflection methods according to the growing condition of a pulled single crystal. <P>SOLUTION: In this method, a plurality of methods different in measuring the level of a liquid surface are set and information correlating the specified position existing between a thermal shield body and the outer circumferential surface of a single crystal and the space between the thermal shield body and the outer circumferential surface of the single crystal is obtained in advance. A space is decided according to the manufacturing condition and a measuring method corresponding to the decided space is selected from the information. The level of the liquid surface of the melt is measured by the selected measuring method. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009051685(A) 申请公布日期 2009.03.12
申请号 JP20070218409 申请日期 2007.08.24
申请人 SUMCO TECHXIV CORP 发明人 HAYASHIDA TOSHIO;KIHARA AYUMI;TAKAMI TAKUAKI
分类号 C30B29/06;C30B15/26 主分类号 C30B29/06
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