| 摘要 |
A deposition system supplies a continuous flow of process gases and sequentially selects among the flowing process gases for delivery to a reaction chamber. In the reaction chamber the delivered process gas acts as an ionizing species and thereby effects the deposition of a target substance upon a substrate. Gases not selected for delivery to the reaction chamber are swept away by a vacuum pump. By making a plurality of process gases continuously available, sequentially selecting among the available process gases, and pumping unused gases away before they enter the reaction chamber, such a system and method provides for continuous, sequential, uninterrupted deposition of a variety of substances, while maintaining desired flow rates and chamber pressures.
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