发明名称 Thin medium i.e. silicon wafer, irradiating and medium penetration recording method for detection of e.g. micro-defect within module, involves determining whether test sample is formed of single material or applied on substrate
摘要 <p>The method involves bringing a thin medium i.e. silicon wafer (2), to be examined, between an X-ray radiation source (1) i.e. X-ray tube, and an imaging system i.e. camera (3), where the medium is used in photovoltaic. Sides of a test sample are irradiated. A determination is made to check whether the test sample includes a mono or polycrystalline structure. A determination is made to check whether the test sample is formed of single material or applied on a substrate, through vaporization of amorphous silicon.</p>
申请公布号 DE102007042521(A1) 申请公布日期 2009.03.12
申请号 DE20071042521 申请日期 2007.09.07
申请人 STOHLER, FRANK 发明人
分类号 G01N23/04;G01N23/18 主分类号 G01N23/04
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