发明名称 Niedertemperaturverfahren zur Herstellung einer Antireflexionsbeschichtung
摘要 The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF<SUB>2 </SUB>( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF<SUB>2 </SUB>layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
申请公布号 DE60132914(T2) 申请公布日期 2009.03.12
申请号 DE2001632914T 申请日期 2001.11.26
申请人 ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE 发明人 HELMSTETTER, YVON;BERNHARD, JEAN-DANIEL;ARROUY, FREDERIC
分类号 C23C14/06;B32B7/02;G02B1/00;G02B1/11 主分类号 C23C14/06
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