| 摘要 |
<P>PROBLEM TO BE SOLVED: To prepare correction data of measurement error of a surface position sensor due to unevenness of a measured surface, use the correction data with the surface position sensor for improving measuring accuracy, and drive a movable body in two-dimensional manner in high accuracy. <P>SOLUTION: While the position of a wafer stage WST is being monitored by an X interferometer 127 and a Y interferometer 16, the wafer stage is moved, and sensors 72a-72d are used to measure the Z positions of Y scales 39Y<SB>1</SB>and 39Y<SB>2</SB>mounted on the upper surface of the wafer stage. In this case, for example, an inclination of the Y scale 39Y<SB>2</SB>in the Y axis direction can be obtained from a difference between two measured results of the surface position sensors 72a and 72b. The inclination of the entire surface of the Y scales 39Y<SB>1</SB>and 39Y<SB>2</SB>is measured, and their two-dimensional unevenness date is prepared. The unevenness data is used to correct the measured result of the sensors, and the corrected measured result is used. Thus, the wafer stage can be accurately driven in two-dimensional manner. <P>COPYRIGHT: (C)2009,JPO&INPIT |
