METHOD FOR DEPOSITING A FLUORINATED LAYER FROM A PRECURSOR MONOMER

摘要

The invention relates to a method for depositing a fluorinated layer onto a substrate, said method comprising the injection of a gaseous mixture containing a fluorinated compound and a carrier gas into a zone for the discharge or post-discharge of an atmospheric cold plasma at a pressure of between 0.8 and 1.2 bar. The invention is characterised in that the fluorinated compound has a boiling temperature higher than 25°C at a pressure of 1 bar.