| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can correct the critical dimension nonuniformity of a photoresist pattern on a semiconductor substrate and can be used versatilely for various phototmasks, and to provide a method of exposing a semiconductor substrate. <P>SOLUTION: An exposure apparatus includes a light source to emit light, a photomask in a path of the light between the light source and the semiconductor substrate and having patterns to be transcribed onto the semiconductor substrate, and a spatial light modulator (SLM) arranged in one of an image correction region of the photomask between the light source and the photomask and adapted to adjust a distribution of intensity of the light. <P>COPYRIGHT: (C)2009,JPO&INPIT |
