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发明名称
VERFAHREN ZUR ABSCHEIDUNG VON SILICIUMOXID UND SILICIUMOXIDNITRID MITTELS EINZELWAFER-NIEDERDRUCK-CVD
摘要
申请公布号
DE60231008(D1)
申请公布日期
2009.03.12
申请号
DE20026031008
申请日期
2002.12.19
申请人
APPLIED MATERIALS INC.
发明人
SUBRAMONY, JANARDHANAN ANAND;YOKOTA, YOSHITAKA;IYER, RAMASESHAN SURYANARAYAN;LUO, LEE;CHEN, AIHUA
分类号
C23C16/40;C23C16/42;C23C16/30;C23C16/44;C23C16/455;C23C16/56;H01L21/316;H01L21/318
主分类号
C23C16/40
代理机构
代理人
主权项
地址
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