| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abnormality detection device, a plasma treatment system and an abnormality detection method of a plasma treatment device, in which a presence of abnormality and a cause can easily be judged. <P>SOLUTION: In the plasma treatment system 1, a wave shape of an output signal of an RF reflection wave obtained through a matching box 30 is monitored, and it is detected whether a peak portion exceeding a predetermined threshold value established for the above wave shape does appear or not. Then, the peak portion is detected, and a duration time in which the peak portion exceeds the threshold value is detected, and the number of the detections of the peak portion in the predetermined time duration is enumerated. Thus, by detecting the duration time and the number of the detections of the peak portion in a wave shape of the RF reflection wave, behaviors of wave shapes of the RF reflection waves which are different between an arc mode and a failure mode can be distinguished, a presence of abnormality and a cause can easily be judged. <P>COPYRIGHT: (C)2009,JPO&INPIT |
