发明名称 METHOD OF MANUFACTURING GALLIUM NITRIDE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing gallium nitride capable of growing a crystal at a low temperature and a low pressure. SOLUTION: The method of manufacturing gallium nitride comprises growing a crystal of gallium nitride by reacting gallium oxide with lithium nitride in a liquid metal bath. The metal bath is preferably composed of gallium. The crystal growth reaction of gallium nitride is preferably carried out at a reaction temperature not lower than 700°C. Further, the molar ratio of gallium oxide to lithium nitride is preferably not greater than one quarter. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009051721(A) 申请公布日期 2009.03.12
申请号 JP20080154184 申请日期 2008.06.12
申请人 LUCELABO:KK 发明人 MABUCHI AKIRA;MINOURA HIDEKI;SUGIURA TAKASHI
分类号 C30B29/38;C30B9/10 主分类号 C30B29/38
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