发明名称 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a defect inspection method and a defect inspection device with high detection sensitivity. SOLUTION: The defect inspection device comprises a stage 282 which scans a sample on a level side, an illuminating optical system 5 which illuminates obliquely from the normal line of the surface of a sample and illuminates linearly onto the sample from the direction inclined to the direction orthogonal to the scanning direction of the stage 282, a forward scattering light detection optical system 20 which is arranged in the same direction as the scanning direction, is installed in an elevation angle for not spatially detecting regular reflection from a pattern in parallel with the scanning direction, and detects scanning light from a linearly emitted region, an image sensor 210 which detects an image formed by the forward scattering light detection optical system 20, and an image processing part 230 which comparers the images detected with the image sensor 210 and determines a defect candidate. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009053132(A) 申请公布日期 2009.03.12
申请号 JP20070222105 申请日期 2007.08.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIBATA YUKIHIRO;MAEDA SHUNJI;CHIKAMATSU SHUICHI
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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