| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus in which the deterioration of a liquid-repellent material is suppressed. <P>SOLUTION: The immersion lithography apparatus is constituted so that the pattern of an original plate is projected on a substrate through a projection optical system and a liquid so as to expose the substrate, and includes a substrate reference plate arranged on a substrate stage to hold the substrate, and a drive portion to drive a field stop which restricts a measuring light irradiated to the substrate reference plate. The substrate reference plate includes a liquid-repellent property region coated by the liquid-repellent material and a non liquid-repellent property region 28 not coated by the liquid-repellent material, wherein a mark EM to be measured by the measuring light is arranged in the non liquid-repellent property region 28. The field stop restricts the measuring light irradiated to the substrate reference plate so that it is irradiated to the mark arranged in the non liquid-repellent property region 28, and is not irradiated to the liquid-repellent property region. <P>COPYRIGHT: (C)2009,JPO&INPIT |
