发明名称 |
CLEANING OF PLASMA CHAMBER WALLS USING NOBLE GAS CLEANING STEP |
摘要 |
An improved reaction chamber cleaning process is provided for removing water residues that makes use of noble-gas plasma reactions. The method is easy applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules to form electronically excited oxygen atoms is used to remove the adsorbed water.
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申请公布号 |
US2009065025(A1) |
申请公布日期 |
2009.03.12 |
申请号 |
US20080205596 |
申请日期 |
2008.09.05 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW (IMEC);KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&D |
发明人 |
URBANOWICZ ADAM MICHAL;BAKLANOV MIKHAIL;SHAMIRYAN DENIS;DE GENDT STEFAN |
分类号 |
B08B7/00 |
主分类号 |
B08B7/00 |
代理机构 |
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