| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stamper manufacturing method that facilitates formation of gradient on the side face of a stamper groove, and that eliminates generation of flashes as well as preventing increase in a defective ratio in making a hologram element by the 2P method using a stamper. <P>SOLUTION: For the purpose of forming as a pattern a resist groove having a side face inclined to the surface on a resist 8, the focal point 13a of exposure light 13 from an exposure light source is shifted to a substrate 1 side from the upside of the resist 8, with the resist 8 exposed using this exposure light 13. Thereafter, with the resist 8 developed, etching is performed on the substrate 1 using the resist 8 as a mask to form, on the surface of the substrate 1, the stamper groove having the side face inclined to the surface. <P>COPYRIGHT: (C)2009,JPO&INPIT |
