| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a silica glass which, even when used for a long time as a material of a chemical reaction apparatus, is restrained from the degradation of the strength and transparency due to etching, etc., of the material surface and hence has excellent chemical resistance; and its production method. <P>SOLUTION: The silica glass at least has an OH group content of 1-50 wt.ppm, a fictive temperature of 800-1,100°C, and metal impurity concentrations of Li, Na, K, Mg, Ca, Cr, Fe, Ni, Cu, and Zn, each being 200 wt.ppb or lower. A production method for producing such a silica glass is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
