PATTERN FORMING METHOD AND MATERIAL FOR FORMING COATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a new pattern forming method in which the number of steps in a double patterning method can be reduced and to provide a material for forming a coating film suitably used for the pattern forming method.

SOLUTION: The method comprises: applying a first chemically amplified resist composition on a support body 1 to form a first resist film 2; selectively exposing and developing the first resist film 2 to form a plurality of first resist patterns 3; forming a coating film 4 on the surface of each first resist pattern 3 by using a material for forming a coating film containing a polymer containing an oxazoline group to form a plurality of coating patterns 5; applying a second chemically amplified resist composition on the support body 1 where the coating patterns 5 are formed so as to form a second resist film 6; and selectively exposing and developing the second resist film 6 to form a pattern comprising the plurality of coating patterns 5 and a second resist pattern 7 formed in the second resist film 6 on the support body 1.

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