发明名称 SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 Almost in the center of the light-receiving surface of an embedded photodiode (31), a floating diffusion (331) is formed and the gate electrode of a transfer transistor (32) is so disposed as to surround it. The impurity concentration (or depth) in the p+-type semiconductor region, n-type semiconductor region or p-type well region of the photodiode (31) is so inclined from the periphery toward the center as to form a potential gradient inclined downward from the periphery toward the center when applying a proper bias voltage to a pn junction. Photoelectric charges generated by receiving light are integrated in the center speedily according to the potential gradient. Since a maximum moving distance from the periphery of the photodiode (31) to the floating diffusion (331) is also short, the photoelectric charge can efficiently be collected even when a period for accumulating the photoelectric charges is short. Thus, detection sensitivity is improved by efficiently utilizing the photoelectric charges generated by the photodiode (31).
申请公布号 WO2009031304(A1) 申请公布日期 2009.03.12
申请号 WO2008JP02428 申请日期 2008.09.04
申请人 TOHOKU UNIVERSITY;SHIMADZU CORPORATION;SUGAWA, SHIGETOSHI;KONDO, YASUSHI;TOMINAGA, HIDEKI 发明人 SUGAWA, SHIGETOSHI;KONDO, YASUSHI;TOMINAGA, HIDEKI
分类号 H01L27/146;H04N5/335;H04N5/374;H04N5/3745 主分类号 H01L27/146
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