发明名称 SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To downsize and integrate a semiconductor device having resistive elements. SOLUTION: On a surface of a semiconductor substrate, an epitaxial layer having a conductivity type opposite to the semiconductor substrate is formed, trenches are formed in parts other than parts used for resistance, and the resistive elements separated from one another are three-dimensionally formed by embedding an insulation film in the trenches. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009054841(A) 申请公布日期 2009.03.12
申请号 JP20070220965 申请日期 2007.08.28
申请人 SEIKO INSTRUMENTS INC 发明人 EBIHARA MIKA
分类号 H01L21/822;H01L21/3205;H01L23/52;H01L27/04 主分类号 H01L21/822
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