| 摘要 |
A photolithographic reticle comprising a transparent substrate; reflective lands on said transparent substrate, said reflective lands having a first width and electromagnetic radiation blocking lands having a second width, the second width being larger than the first width of said reflective lands, said electromagnetic radiation blocking lands located on said reflective lands and said transparent substrate, such that edges formed by said electromagnetic radiation blocking lands are in contact with said transparent substrate (as granted omitting the wavelength; see paragraph 9 stating that other wavelengths can be used as well). |
