| 摘要 |
<p>An exposure method for exposing a substrate P with an exposure light EL via an projection optical system PL and a liquid 1 includes: a first step of optically observing a liquid contact portion which comes into contact with the liquid 1 and storing first image data obtained by the optical observation; a second step of optically observing the liquid contact portion after the liquid contact portion came into contact with the liquid 1, for example, after the liquid immersion exposure and obtaining second image data obtained by the optical observation; and a third step of comparing the first image data and the second image data to judge whether abnormality of observation objective portion is present or absent. It is possible to efficiently judge whether or not the abnormality of the liquid-contact portion, of the exposure apparatus which performs the exposure by the immersion method, is present or absent.</p> |
