| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam device capable of evaluating a pattern with a high throughput by making a MCP have a long life. <P>SOLUTION: This electron beam device is provided with a primary optical system 10 to separate an electron beam emitted from an electron gun, to focus the separate beams on a sample 28 as multiple beams, and to make them scan, a secondary optical system 40 to expand spaces between a plurality of secondary electrons emitted from the surface of the sample, and a detecting device 50 to detect the secondary electrons outputted from the secondary optical system. The detecting device includes a MCP 52 to amplify the secondary electrons outputted from the secondary optical system 40, and multiple anodes 54 to detect electrical quantities of the secondary electrons outputted from the MCP. The multiple anodes have escape passages 64 formed in the multiple anodes, and the MCP and the multiple anodes are disposed face to face so as to form a prescribed gap 55 between the MCP and the multiple anodes. In this escape passage, the gap is in communication with a space outside of the gap. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
