发明名称 |
COMPOSIT MATRIX COMPRISING THIN MEMBRANE OF INORGANIC OXIDE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A complex matrix made of a thin film of an inorganic oxide and a manufacturing method thereof are provided to offer superior adhesive force between the inorganic oxide of thin film and a silicon wafer by forming a single layer of the inorganic oxide of thin film or a multilayer of the thin film. A manufacturing method for a complex matrix made of a thin film of an inorganic oxide comprises the following steps of: performing a sintering process after performing a first electric radiation process of a sol for radiating on a surface of a silicon water; forming an inorganic oxide thin film on the water; and performing the sintering process after performing a second electric radiation process of a sol different with the first used sol on the inorganic oxide thin film formed on a surface of another silicon wafer repeatedly. The inorganic oxide contained in the inorganic oxide thin film is one selected from a particle or fiber of which diameter is 1,000nm or less. |
申请公布号 |
KR20090025557(A) |
申请公布日期 |
2009.03.11 |
申请号 |
KR20070090501 |
申请日期 |
2007.09.06 |
申请人 |
INDUSTRIAL COOPERATION FOUNDATION CHONBUK NATIONAL UNIVERSITY |
发明人 |
KIM, HAK YONG;ARYL SANTOSH |
分类号 |
B05D7/00;B05D3/02;B05D5/12;B32B18/00 |
主分类号 |
B05D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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