| 摘要 |
PROBLEM TO BE SOLVED: To provide a sulfonyldiazomethane compound which can suitably be used as a phooxodiation generator for chemical amplification type resist materials, contains carboxylate groups in the molecule, thereby has an excellent resolution property and an excellent focus margin, scarcely causes the change of line width and the deterioration of the shape even when PED is carried out over a long time, hardly contains foreign matters after coated, developed and peeled, gives excellent pattern profile shapes, has a high resolution property suitable for fine processing, and especially largely exhibits the power in far UV light lithography. SOLUTION: This compound is a sulfonyldiazomethane compound of general formula (1) [R1 is a 1 to 10C alkyl or a 6 to 14C aryl; R2 is a 1 to 6C alkyl; G is SO2 or CO; R3 is a 1 to 10C alkyl or a 6 to 14C aryl; (p) is an integer of 0 to 4; (q) is an integer of 1 to 5; 1<=(p)+(q)<=5; (n) is 1 or 2; (m) is 0 or 1; (n)+(m)=2]. |
