发明名称 |
MULTILAYER IMAGEABLE ELEMENT WITH IMPROVED CHEMICAL RESISTANCE |
摘要 |
<p>Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymer that is removable using an alkaline developer and in which from about 1 to about 50 mol % of its recurring units are derived from one or more of the ethylenically unsaturated polymerizable monomers represented by the following Structure (I): <?in-line-formulae description="In-line Formulae" end="lead"?>CH<SUB>2</SUB>-C(R<SUP>1</SUP>)C(-O)NR<SUP>2</SUP>(CR<SUP>3</SUP>R<SUP>4</SUP>)<SUB>n</SUB>OH (I)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>1</SUP>, R<SUP>2</SUP>, R<SUP>3</SUP>, and R<SUP>4 </SUP>are independently hydrogen, lower alkyl, or phenyl, and n is 1 to 20. The imageable elements having improved resistance to development and printing chemicals and solvents.</p> |
申请公布号 |
EP1943104(B1) |
申请公布日期 |
2009.03.11 |
申请号 |
EP20060826050 |
申请日期 |
2006.10.17 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
RAY, KEVIN BARRY;SHERIFF, EUGENE LYNN;RAY, JOANNE;KREBS, ANDREW |
分类号 |
B41M5/36;B41C1/10;H05K3/12 |
主分类号 |
B41M5/36 |
代理机构 |
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代理人 |
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地址 |
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