MAINTENANCE METHOD, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member (30) which forms a liquid-immersion area by supplying liquid (1) in a space between an optical member (2) and a substrate (P); a liquid supply mechanism (10) which supplies the liquid (1) to the liquid-immersion space; a substrate stage (PST) which moves the substrate (P); and a measuring stage (MST) on which a reference mark is formed. To clean the liquid-immersion space-forming member (30), a cleaning liquid is supplied to a space between the measuring stage (MST) and the liquid-immersion space-forming member (30). The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member (30). The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus.