发明名称 Method of fabricating semiconductor memory device
摘要 In a semiconductor memory device and a method of fabricating the same, a semiconductor memory device having a transistor and a data storing portion includes a heating portion interposed between the transistor and the data storing portion and a metal interconnection layer connected to the data storing portion, wherein the data storing portion includes a chalcogenide material layer, which undergoes a phase change due to a heating of the heating portion, for storing data therein.
申请公布号 US7501307(B2) 申请公布日期 2009.03.10
申请号 US20070650972 申请日期 2007.01.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JUNG-HYUN;PARK YOUNG-SOO;LEE WON-TAE
分类号 H01L21/00;H01L27/105;H01L27/10;H01L27/24;H01L45/00 主分类号 H01L21/00
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