发明名称 Method for preparing a poled structure by using leakage and tunnel effects
摘要 A method for preparing a poled structure forms a ferroelectric substrate with a first polarization direction, wherein the ferroelectric substrate has a first surface and a second surface. An electrode-patterning process is then performed to form a first electrode structure on the first surface, and the first electrode structure includes a plurality of active blocks and a plurality of passive blocks, wherein at least one passive block is sandwiched between two active blocks. Subsequently, a poling process is performed including applying a predetermined voltage to the active blocks and floating the passive blocks such that a current such as a leakage current or a tunnel current is generated from the active blocks to the passive blocks to form a plurality of inverted domains with a second polarization direction in the ferroelectric substrate.
申请公布号 US7502163(B1) 申请公布日期 2009.03.10
申请号 US20070938738 申请日期 2007.11.12
申请人 HC PHOTONICS CORP. 发明人 HONG TSAI HAU;LIN TZE CHIA;CHOU MING HSIEN
分类号 G02F1/35 主分类号 G02F1/35
代理机构 代理人
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