发明名称 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
摘要 The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a first projected projection beam of radiation onto the target object using the at least one reflective device in a first orientation. The invention further includes using a tilting device for tilting the at least one reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, producing a second projected projection beam of radiation onto the target object, determining a lateral shift of the first and second projected projection beams on the target object, and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
申请公布号 US7502097(B2) 申请公布日期 2009.03.10
申请号 US20050270826 申请日期 2005.11.10
申请人 ASML NETHERLANDS B.V. 发明人 HAUSCHILD JAN
分类号 G03B27/52;G03B27/32;G03B27/42 主分类号 G03B27/52
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