发明名称 |
Anti-reflective coating containing sulfur atom |
摘要 |
There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.
|
申请公布号 |
US7501229(B2) |
申请公布日期 |
2009.03.10 |
申请号 |
US20050592805 |
申请日期 |
2005.03.15 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
HIROI YOSHIOMI;KISHIOKA TAKAHIRO;NAKAYAMA KEISUKE;SAKAMOTO RIKIMARU |
分类号 |
G03F7/11;C08L101/00;G03F7/09;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|