发明名称 Alignment stage, exposure apparatus, and semiconductor device manufacturing method
摘要 An alignment stage includes a first plane mirror which extends in two directions substantially perpendicular to each other in order to measure the position of a stage in the translation direction and the tilt of the stage in the direction of height, a first measurement unit which irradiates the plane mirror with a laser beam and measures the position of the stage in the translation direction by using reflection of the laser beam, and a second measurement unit which irradiates the first plane mirror with a laser beam and measures the position by using reflection of the laser beam at a position vertically spaced apart from the firs measurement unit in order to measure the tilt of the stage. A third measurement unit which measures the tilt of the stage with respect to the surface of the surface plate in the direction of height, and an arithmetic unit calculates the error of the first plane mirror corresponding to each position of the stage on the basis of the difference between the first tilt amount based on the difference between the measurement results of the first and second measurement units, and the second tilt amount measured by the third measurement unit. A control unit corrects the first tilt amount and drives the stage on the basis of an error obtained in advance by the arithmetic unit in accordance with a position to which the stage moves.
申请公布号 US7499180(B2) 申请公布日期 2009.03.03
申请号 US20020330081 申请日期 2002.12.30
申请人 CANON KABUSHIKI KAISHA 发明人 HATTORI TADASHI
分类号 G01B9/02;G01B11/00;G01B11/26;G03F7/20;G03F9/00;G03F9/02;H01L21/027 主分类号 G01B9/02
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