| 发明名称 |
Holographic mask for lithographic apparatus and device manufacturing method |
| 摘要 |
A holographic mask includes a plurality of pixels each imparting a calculated phase and/or amplitude change to the projection beam to provide an image that is parallel to the mask. The holographic mask is used displaced from the best object plane of the projection lens.
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| 申请公布号 |
US7499149(B2) |
申请公布日期 |
2009.03.03 |
| 申请号 |
US20040872775 |
申请日期 |
2004.06.22 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HENDRIKS BERNARDUS HENDRIKUS WILHELMUS;VAN DER WERF JAN EVERT |
| 分类号 |
G03B27/62;G03F1/08;G03B27/00;G03C5/00;G03F1/00;G03F7/00;G03F7/20;G21K5/00;H01L21/027 |
主分类号 |
G03B27/62 |
| 代理机构 |
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代理人 |
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