发明名称 Semiconductor memory
摘要 A SRAM memory is composed of FD-SOI transistors, and performance of the memory cell is improved by controlling an electric potential of a layer under a buried oxide film of a SOI transistor constituting a driver transistor. Performance of the SRAM circuit in the low power voltage state is improved. In the SRAM memory cell composed of the FD-SOI transistor, an electric potential of a well under a BOX layer is controlled to control a threshold voltage Vth, thereby increasing a current. Thus, the operations of the memory cell can be stabilized.
申请公布号 US7498637(B2) 申请公布日期 2009.03.03
申请号 US20050151455 申请日期 2005.06.14
申请人 RENESAS TECHNOLOGY CORP. 发明人 YAMAOKA MASANAO;OSADA KENICHI;ITOH KIYOO;KAWAHARA TAKAYUKI
分类号 H01L27/01;G11C11/00;G11C11/412;H01L21/8244;H01L27/108;H01L27/11;H01L27/12;H01L31/0392 主分类号 H01L27/01
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