发明名称 |
Method and system for detection of wafer centering in a track lithography tool |
摘要 |
A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.
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申请公布号 |
US7497026(B2) |
申请公布日期 |
2009.03.03 |
申请号 |
US20070763352 |
申请日期 |
2007.06.14 |
申请人 |
SOKUDO CO., LTD. |
发明人 |
HERCHEN HARALD;PANG LILY;PORRAS ERICA |
分类号 |
H01L21/00;G01B9/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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