СПОСОБ ПОЛУЧЕНИЯ ВЫСОКОДИСПЕРСНОГО ДИОКСИДА КРЕМНИЯ

摘要

FIELD: chemistry. ^ SUBSTANCE: fine-grained silicon dioxide is obtained through carbonisation of a sodium silicate solution at temperature 30-50C with a gaseous mixture containing carbon dioxide being fed at a rate of 10-30 m/s for 45-70 minutes. The obtained suspension is filtered and the silicon dioxide residue obtained after filtration is washed with water and immediately dried at temperature 120 - 140C to obtain commercial-grade silicon dioxide. The silicon dioxide residue is cleaned with water in a single step. The initial sodium silicate solutions used are solutions which are by-products of processing titanium-silicon concentrates from the Yagersk deposit. ^ EFFECT: possibility of recycling industrial solutions from production of titanium-silicon concentrates to obtain fine-grained silicon dioxide, reduction of amount of harmful wastes and energy consumption of the process. ^ 3 cl