INJECTION UNIT OF ATOMIC LAYER DEPOSITION DEVICE

摘要

An apparatus for depositing a thin film is provided to prevent reactive gas from being mixed by effectively inhaling residual gas emitted to the substrate through comprising a suction unit to communicate periodically with an emission unit. A susceptor(130) axle-rotates in a housing. A plurality of substrates are settled according to a columnar direction of the susceptor. An emission unit(110) is located at constant interval with the susceptor. The emission unit sprays the gas of the different kind to the substrate. The suction unit(120) axle-rotates at the same speed as the susceptor. The suction unit periodically communicates with the emission unit according to rotational location and inhales the gas within the emission unit. A communicating hole of the suction unit communicates with a communicating hole of the emission unit.