发明名称 APPARATUS OF TREATING A SUBSTRATE
摘要 A substrate processing apparatus is provided to simplify assembling process of a frame and a base by sliding-combining a base supporting processing units with a frame. Processing units are comprised in order to perform a series of processes about a substrate. A base(200) has a plate-shape for supporting the processing unit. The base is protruded from the lower surface of a plate. The base comprises a sliding block(210) and a sliding foot(220). The sliding block is extended to a sliding direction. The sliding foot is positioned at one side of the lower surface of the plate and slides with supporting the plate. A frame(300) is arranged in the lower part of the base. The frame comprises a sliding guide(310) for guiding the sliding block.
申请公布号 KR20090020794(A) 申请公布日期 2009.02.27
申请号 KR20070085372 申请日期 2007.08.24
申请人 SECRON CO., LTD. 发明人 KIM, SUN OH
分类号 H01L21/683 主分类号 H01L21/683
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