| 摘要 |
FIELD: physics. ^ SUBSTANCE: group of inventions is related to electronics, in particular, to devices intended for electron-beam treatment, welding and beam plasmachemical modification of structural materials in medium at the pressure in working chamber from 102 Pa to 10-2 Pa. Injector of electrons stipulates for vacuum body structure that comprises differential pumping system (DPS) on axis of transient-time channel with possibility of sliding, and this system is separated into short sections by hollow conic diaphragms, which will make it possible to reduce length of electron beam transportation path, to provide efficient pumping of electron gun volumes and DPS sections, to eliminate possibility of electron beam control system screening and effect of induced magnetic field at control magnetic field. Selection of location place for the first diaphragm installed along direction of electron beam motion and selection of hole size in its smaller base makes it possible to reduce effect of ion flow at units of electron gun. The mentioned altogether will make it possible to increase useful capacity of electron beam, to provide reliable operation of electron beam and injector as a whole, to provide efficient and reliable control of beam. Structural features of working chamber of electron-beam unit in combination with suggested injector will make it possible to expand functional resources of unit due to application of beam energy for heating, excitation and maintenance of different types of discharge in medium with simultaneous application of scattered electrons in technological processes, and also to provide reliable operation of devices due to possibility to perform control and regulation of electron beam parameters and technological parameters in working chamber. ^ EFFECT: increased useful capacity of electron beam, provision of reliable operation of electron gun and injector as a whole, provision of efficient and reliable operation of beam. ^ 2 cl, 1 dwg |
