| 摘要 |
A polishing pad tile and the mosaic polishing pad manufactured using the same are provided to smoothly ejected and the polishing fluid and the polishing remnant through the interstitial space gap formed between tiles. A polishing pad tile(P) comprises the abrasive layer(1); the fastener mechanism support layer(2) formed in the rear side of abrasive layer; and the groove(4) for the fastener mechanism passing through to the rear side. The polishing pad tile is connected by the fastener mechanism like bolt in the table. The abrasive layer is the first class selected among the pad laminating the elastomer layer on the pad in which elastomer is dipped, and the pad including the elastomer dipped within non-woven, and the pad formed into the elastomer.
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