NANO-IMPRINT LITHOGRAPHY SYSTM FOR LARGE SCALE

摘要

A nano-imprint lithography apparatus for a large scale is provided to form pattern uniformly in patterned media manufacture of the nano-scale of a hard disk drive(HDD) by giving uniform contact pressure. A mold chuck fixing a mold at the lower part of a first chamber(110) is installed. A second chamber(120) moves to top and bottom in the first chamber. A rubber pad is installed on the top of the first chamber. A substrate for imprint is mounted on the rubber pad. The first chamber or the second chamber is horizontally driven with a stage. The second chamber is perpendicularly driven with a vertical transfer part. A linear guide(140) is arranged on the first chamber. An alignment optical device(150) and an UV curing apparatus(160) are installed at the linear guide.