发明名称 INTEGRATED CIRCUIT SHIELD STRUCTURE AND METHOD OF FABRICATION THEREOF
摘要 <p>INTEGRATED CIRCUIT SHIELD STRUCTURE AND METHOD OF FABRICATION THEREOF Embodiments of the invention provide an integrated circuit structure comprising: a substrate; a shield structure comprising a shield member and a ground strap formed on the substrate, wherein the shield member comprises a non-metallic portion, and the ground strap comprises a metallic portion.</p>
申请公布号 SG149753(A1) 申请公布日期 2009.02.27
申请号 SG20080049371 申请日期 2008.06.30
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD 发明人 FEI LIM SUH;WAI CHEW KOK;SANFORD CHU SHAO-FU;MICHAEL CHENG CHYE HUAT
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