发明名称 ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide equipment capable of automatically adjusting its conditions which change owing to the potential measurement of a sample's surface using a charged particle beam or an electrically charged sample, while controlling a change of the sample's electric potential induced by irradiating the charged particle beam. SOLUTION: The equipment automatically adjusts its conditions based on the result measured by a method for detecting information on a sample's potential by using a signal acquired by applying a voltage to the sample so that a charged particle beam may not reach the sample, when irradiating the beam toward the sample. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009043936(A) 申请公布日期 2009.02.26
申请号 JP20070207342 申请日期 2007.08.09
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IKEGAMI AKIRA;YAMAZAKI MINORU;KAZUMI HIDEYUKI;TAKEUCHI KOICHIRO;MURAKOSHI HISAYA
分类号 H01L21/66;H01J37/20;H01J37/28 主分类号 H01L21/66
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