COATING, DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To control an excessive waiting period of a substrate in a waiting module by effectively delivering the substrate before exposure from the waiting module at timing synchronous with the completion of preparation for heat treatment by a heat treatment module for heating the substrate after the exposure. SOLUTION: For a group of substrates before the substrates as objects subject to a staying time calculation, a time t1 until timing that preparation is completed for the heat treatment of the substrate B1 in the heat treatment module for the relevant substrate B1 from timing that the substrate B1 as the object subject to the waiting time calculation is now ready to be carried out of the waiting module and a time t2 until timing that the substrate B1 reaches the heat treatment module used for the relevant substrate B1 from timing that the substrate B1 as the object subject to the timing calculation is carried out of the waiting module are calculated on the basis of a staying time t3 in the exposing apparatus calculated from carry-in and carry-out times of the substrate B1 to and from the exposing apparatus. Thereafter, the waiting time of the substrate B1 in the waiting module can be obtained by the calculation of t1-t2. COPYRIGHT: (C)2009,JPO&INPIT