| 摘要 |
A polishing pad and a method of manufacture thereof are provided to maintain the excellent polishing capacity and the low scratch production rate by small setting up the alignment angle of the ultrafine fibers arranged in the surface the uniform surface is formed and forming the air pores between ultrafine fibers. A polishing pad comprises the non-woven interlacing the ultrafine fiber (F) having the fineness of 0.001~0.3 denier and is formed, and the elastomer impregnated into the non-woven. The ultrafine fiber is arranged in above surface about the longitudinal direction of the polishing pad to the alignment angle(theta) of 0~30°, the elastomer is the first class selected between the polyurethane resin and polyurea resin. The ultrafine fiber is made as the polyamide resin.
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