发明名称 IMPROVED SPLIT GATE TYPE NON-VOLATILE FLASH MEMORY CELL AND ARRAY WHICH HAVE FLOATING GATE, CONTROL GATE, SELECTION GATE, AND ERASE GATE WITH OVERHANG ON FLOATING GATE, AND METHOD FOR MANUFACTURING
摘要 <P>PROBLEM TO BE SOLVED: To improve the efficiency of erasing a cell by the specific dimensional relation of an erase gate with a floating gate. <P>SOLUTION: An improved split gate type non-volatile memory cell having in a substrate a second conductivity first region, a second conductivity second region, and a channel region between the first region and the second region is formed in a substantially single crystal substrate of the first conductivity type. The cell has a selection gate on the upper portion of the channel region, a floating gate on another portion of the channel, a control gate on the floating gate, and an erase gate adjoining the floating gate. The erase gate has an overhang extending over the floating gate. The ratio of the dimension of the overhang against the dimension of a separation in the vertical direction between the floating gate and the erase gate is in between about 1.0 and 2.5. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009044164(A) 申请公布日期 2009.02.26
申请号 JP20080225276 申请日期 2008.08.06
申请人 SILICON STORAGE TECHNOLOGY INC 发明人 LIU XIANG;LEVI AMITAY;KOTOV ALEXANDER;TKACHEV YURI;MARKOV VIKTOR;JIA JAMES YINGBO;SU CHIEN-SHENG;HU YAW WEN
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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