发明名称 |
IMPROVED SPLIT GATE TYPE NON-VOLATILE FLASH MEMORY CELL AND ARRAY WHICH HAVE FLOATING GATE, CONTROL GATE, SELECTION GATE, AND ERASE GATE WITH OVERHANG ON FLOATING GATE, AND METHOD FOR MANUFACTURING |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve the efficiency of erasing a cell by the specific dimensional relation of an erase gate with a floating gate. <P>SOLUTION: An improved split gate type non-volatile memory cell having in a substrate a second conductivity first region, a second conductivity second region, and a channel region between the first region and the second region is formed in a substantially single crystal substrate of the first conductivity type. The cell has a selection gate on the upper portion of the channel region, a floating gate on another portion of the channel, a control gate on the floating gate, and an erase gate adjoining the floating gate. The erase gate has an overhang extending over the floating gate. The ratio of the dimension of the overhang against the dimension of a separation in the vertical direction between the floating gate and the erase gate is in between about 1.0 and 2.5. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009044164(A) |
申请公布日期 |
2009.02.26 |
申请号 |
JP20080225276 |
申请日期 |
2008.08.06 |
申请人 |
SILICON STORAGE TECHNOLOGY INC |
发明人 |
LIU XIANG;LEVI AMITAY;KOTOV ALEXANDER;TKACHEV YURI;MARKOV VIKTOR;JIA JAMES YINGBO;SU CHIEN-SHENG;HU YAW WEN |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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