PATTERN SHAPE EVALUATION METHOD, PATTERN SHAPE EVALUATION DEVICE, PATTERN SHAPE EVALUATING DATA GENERATION DEVICE AND SEMICONDUCTOR SHAPE EVALUATION SYSTEM USING THE SAME

摘要

A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.